Invited Speakers

Confirmed Invited Speakers Symposium A.

Name	Affiliation	Topic	Note
Dr. Kenta Doi	ULVAC, Inc. Japan	A Novel Plasma Etching Technology of Silicon using Dual Frequency Inductive Coupled Plasma	Invited-A-1
Prof. Shih-Nan Hsiao	Nagoya University, Japan	Novel Synergistic Reactions during Cryogenic HF plasma Etching for Advanced Semiconductor Device Processing	Invited-A-2
Dr. Daniel Montero	IMEC, Belgium	Cryogenic etch processes at tight pitch BEOL interconnects	Invited-A-3
Dr. Christophe Cardinaud	IMN CNRS - Nantes University	CONTRIBUTION OF IN SITU XPS TO THE INVESTIGATION OF ETCHING MECHANISMS AT CRYOGENIC TEMPERATURES	Invited-A-4
Prof. Thomas Tillocher	GREMI - Université d'Orléans - CNRS	CRYOGENIC BOSCH PROCESS USING CF4 PLASMA IN DEPOSITION REGIME	Invited-A-5
Dr. Mingmei Wang	Lam Research Corporation, Fremont, USA	Halogens in Cryogenic Etching	Invited-A-6
Dr. Yu-Hao Tsai	TEL Technology Center, America, LLC, Albany, NY, USA.	Physical Modeling Aided Etching Innovation for Semiconductor Manufacturing	Invited-A-7
Dr. Mitsuhiro Omura	Kioxia Corporation, Yokkaichi, Japan	Challenges in Low Temperature High-aspect-ratio Etching for 3D Flash Memory	Invited-A-8
Dr. Lei Liao	Applied Materials, Sunnyvale, US	Si Containing Materials Etching at Cryogenic Temperature with Sym3 CTx for Advanced Packaging	Invited-A-9

Confirmed Invited Speakers Symposium B.

Name	Affiliation	Topic	Note
Prof. Oi Lun (Helena) Li	Pusan National University, Korea	Plasma-engineered Chlorine-repulsive Electrocatalysts for Seawater Batteries and Electrolysis	Invited-B-1
Prof. Sun Jung Kim	Dong guk University, Korea	Epigenetic modifications induced by cold atmospheric plasma in breast cancer cells	Invited-B-2
Prof. Masayuki Tokitani	National Institute for Fusion Science, Japan	Advanced Multi-Step Brazing (AMSB) for fabrication of new type of W/ODS-Cu plasma facing components, and its impact on other fields applications	Invited-B-3
Prof. Hiroki Natsume	Global Research Institute of Nuclear Energy, Tokai University, Hiratsuka, Japan	Integrated Transport Code DISCOVER for Helium Detached Plasma in a Linear Device	Invited-B-4
Prof. Seiki Saito	Yamagata University, Yonezawa, Japan	Molecular Dynamics Simulation for Hydrogen Recycling on Tungsten Wall	Invited-B-5
Dr. Chenxu Wang	National Institute for Fusion Science, Toki, Japan	FDTD Analysis of Millimeter-Wave Vortex Propagation in Magnetized Plasma	Invited-B-6
Prof. Magdaleno Jr Vasquez	University of the Philippines, Diliman, Quezon City, Philippines	PLASMA-DRIVEN REDUCTION OF SILVER NANOPARTICLES ON TITANIUM DIOXIDE SUPPORT MATRICES	Invited-B-7
Prof. Masaru Hori	Nagoya University, Nagoya, Japan	Challenge in the Creation of Non-equilibrium Medicinal Chemistry	Invited-B-8
Dr. MASAYUKI YOKOYAMA	National Institute for Fusion Science, Rokkasho Research Center, Rokkasho, Japan	Progress of Statistical-Mathematical Fusion Research	Invited-B-9
Prof. Dogyun Hwangbo	University of Tsukuba, Tsukuba, Japan	Tungsten surface changes under divertor relevant environments and their responses to high-density plasma exposures	Invited-B-10
Prof. Quan Shi	the University of Tokyo, Japan	Reduction in temperature threshold of fuzz growth induced by a initially rough surface	Invited -B-11
Prof. Mudtorlep Nisoa	Walailak University, Thailand	Development of High-Power Thermal Plasma Technology for Hydrogen Production by Hydrocarbon Gas Pyrolysis	Invited -B-12

Confirmed Invited Speakers Symposium C.

Name	Affiliation	Topic	Note
Prof. Wan-Yu Wu	National United University, Taiwan	Enhanced Ionization and Thin Film Modulation via Bipulse-HiPIMS Co-Sputtering: A Multi-System Study	Invited-C-1
Prof. Phitsanu Poolcharuansin	Mahasarakham University, Thailand	DISCHARGE AND PLASMA CHARACTERISTICS IN Ar/C₂H₂ REACTIVE MAGNETRON SPUTTERING	Invited-C-2
Prof. Yu-Ching Huang	Ming Chi University of Technology, Taiwan	Advancing the Commercialization of 4-Terminal Perovskite/Si Tandem Solar Cells	Invited-C-3
Prof. Tetsuhide Shimizu	Tokyo Metropolitan University, Japan	Reactive gas “less” sputtering of AlN using microwave plasma-assisted HiPIMS	Invited -C-4
Prof. Tuan Hoang Tong	University of Science, Ho Chi Minh City, Viet Nam	NANO-ZNO-DECORATED LOTUS FIBERS FOR NONVOLATILE MEMRISTORS	Invited -C-5
Prof. Chi-Hsien Huang	Department of Materials Engineering, Center for Plasma and Thin Film Technologies, Ming Chi University of Technology	Graphene-based biosensors toward Alzheimer’s disease biomarker	Invited -C-6
Prof. Fan-Bean Wu	National United University, Taiwan.	A Comparative Study on Refractory Metal Nitride Films Fabricated through RFMS and HiPIMS Techniques	Invited-C-7
Prof. Pak-Man Yiu	Ming Chi University of Technology, Taiwan	Magnetron Sputtered Multicomponent Alloy Coatings for Surface Wettability Modification	Invited-C-8