Symposium A - Low temperature and cryogenic plasma etching technology |
Prof. Remi Dussart* | GREMI - Université d'Orléans, France |
Prof. Mark Kushner | University of Michigan, USA |
Prof. Shih-Nan Hsiao | Nagoya University, Japan |
Symposium B - Plasma technology |
Prof. Satoshi Hamaguchi* | Osaka University, Japan |
Prof. Oi Lun Helena LI | Pusan National University, Korea |
Prof. Magdaleno R. Vasquez Jr. | University of the Philippines Diliman, Philippine |
Symposium C - Thin film and coating technology for sustainable development goals |
Prof. Yu-Ching Huang* | Ming Chi University of Technology, Taiwan |
Prof. Wan-Yu Wu | National United University, Taiwan |
Prof. Tetsuhide Shimizu | Tokyo Metropolitan University, Japan |